International Radiation Detectors, Inc.
Electron Detectors
Silicon electron detectors (AXUV-series, p-n junction
photodiodes) have been developed by IRD for detection of electrons and low energy ions.
Unlike common photodiodes, these diodes do not have a doped
dead-region and have zero surface recombination resulting in
near theoretical quantum efficiencies for low energy
electrons and ions.
The AXUV photodiode behavior is characterized by
electron gain Ge, which is the number of charges generated per electron
incident upon the detector, or responsivity R, the number of charges generated per
incident energy ε. The following relation exists between Ge and R for monoenergetic electrons incident upon the detector:
Ge = R x ε
Responsivity is proportional to the number of electron hole
pairs generated in the AXUV photodiode. As the
photodiode is exposed to electrons and ions, electron-hole
pairs (carriers) are created; the electric field in the p-n
junction separates the charges and drives the current in
the external circuit. The silicon electron-hole creation
energy is found to be 3.71 eV in silicon [1]. For photons, this
value can be used to calculate the ideal responsivity in a
lossless system, RA = 1/3.71 electron charge/eV = 0.27 C/J = 0.27 A/W.
Particles incident upon a detector surface have
additional loss mechanisms not present for photons. For electrons, these losses
are summarized in Equation 1, taken from Reference [1].
Rm = RA (1 - ΔDL
- ΔB - ΔR - Γ)
Equation 1:Electron response equation, including terms for responsivity loss.
| Rm |
Measured responsivity (A/W) |
| RA |
Ideal responsivity (A/W) 0.27 A/W in Si |
| ΔDL |
Fractional losses due to dead layer absorption |
| ΔB |
Fractional losses due to incident electron backscattering |
| ΔR |
Fractional losses due to residual loss effects in photodiode |
| Γ |
Low incident energy enhancement factor from
electron-hole generation in dead layer |
In the AXUV series photodiodess, dead layer and residual losses are minimized.
Residual losses are dominated by recombination of the electron-hole pairs generation in the
silicon-silicon oxide interface, which is non-existant in the 100% internal efficency AXUV photodiodes.
Dead layer losses in the the 30 - 70 Â front oxide window are less than 0.1% at
ε > 2 keV, increasing at energies lower than 2 keV [1]. This leaves backcattering from the front surface
as the dominant loss mechanism at ε > 2 keV. As absorption depths for the low energy ions and
electrons are less than 1 micrometer in silicon, when losses from the front oxide window and backscattered
electrons are subtracted measured data indicates 100% internal carrier collection efficiency and near
theoretical gain/responsivity. Measured responsivity data is shown in Figure
1, while Figure 2 shows the same results in terms of electron gain.
Figure 1: Photon and electron responsivity for the AXUV photodiode.
Figure 2: Electron gain for the AXUV photodiode.
References:
1] H. O. Funsten, D. M. Suszcynsky, S. M. Ritzau, and R. Korde, "Response of 100% Internal Quantum Efficiency Silicon
Photodiodes to 200 eV to 40 keV Electrons." IEEE Transactions on Nuclear Science, Vol. 44, No. 6, December 1997, 2561-2565
2] Herbert O. Funsten, Stephen M. Ritzau, Ronnie W. Harper, and Raj Korde,
"Response of 100% Internal Carrier Collection Efficiency Silicon Photodiodes to Low-Energy Ions"
IEEE Transactions on Nuclear Science, Vol. 48, No. 6, p. 1785-1789, 2001
3] H. O. Funsten, S. M. Ritzau, R. W. Harper, and R. Korde
"Fundamental limits to detection of low-energy ions using silicon solid-state detectors."
Applied Physics Letters, Vol. 84, No. 18, p. 3552-3554, 2004
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